Raj Saini , MSc

Advanced Workflow Specialist UK, Leica Microsystems

MSc Halbleiterbauelemente - Universität Lancaster (Brunel, Angewandte Physik)

Karriere:

TI; Chip-Layout
Fab (Photolithographie-Verfahrensingenieurin)
BioRad; Overlay-Metrologie-System (Fotolithographie-Anwendungstechnikerin)
KLA-Tencor; Metrologie und Niederspannungs-SEM (Photolith-Senior-Anwendungsingenieurin)
NVS; Prozesssteuerungssoftware für Photolith (Anwendungsmanagerin, Projektleiterin)
Malvern Instrumente: Analysatoren (Optisch, Raman, NIR: Service Spezialistin)
Leica Microsystems (Advanced Workflow Specialist)

Region of a patterned wafer inspected using optical microscopy and automated and reproducible DIC (differential interference contrast). With DIC users are able to visualize small height differences on the wafer surface more easily.

6-Inch Wafer Inspection Microscope for Reliably Observing Small Height Differences

A 6-inch wafer inspection microscope with automated and reproducible DIC (differential interference contrast) imaging, no matter the skill level of users, is described in this article. Manufacturing…